Photrak™ - Liquid Photoimageable Etch-resists
Photrak™ is a new generation liquid Photoimageable etch resist that offers a low cost, high quality alternative to dry film. Photrak™ is ideal for today's high yield, low cost, fine line, multilayer PCBs.
Applied by screen print, curtain coat, electrostatic spray or air spray, but best by roller coating, Photrak™ can achieve a dry film thickness of 10µm (0.4 mil). The result is increased fine line capabilities, fast exposure, a wide processing window and excellent adhesion to copper surfaces. Because Photrak® increases developer and stripper solution bath life by 100%, fabricators use less chemical solutions and reduce the need to treat waste water.
- Sub 25 µm (1 mil) resolution capability
- Rapid tack-dry delivering hard scuff resistance surface
- Stackable after tack-dry for over 72 hours
- 50 to 100mJ exposure allowing and fast throughput
- Excellent adhesion and conformance to copper coatings
- Latent image after exposure
- Versions available for acid and alkali etching systems
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Photrak™ - Liquid Photoimageable Etch-resists
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